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Siemens advances self-verifying agentic AI workflows for semiconductor and PCB design

Combines Siemens’ EDA expertise and software with NVIDIA AI infrastructure and software to improve result quality, time-to-results, tool-calling reliability and token efficiency for long-running engineering workloads Enables agentic AI workflows that help engineers improve productivity and design quality across the electronic design automation (EDA) lifecycle Delivers more predictable, trusted outcomes...

SPM Wafer Cleaning for Advanced Semiconductor Manufacturing

Wafer cleaning is one of the most critical steps in the semiconductor process flow, especially as dimensions continue to shrink to below the 1-nanometer (nm) node. Photoresist residue and particulates can reduce yields in large-die AI chips, impacting the performance of the final product or causing the chips to be scrapped.   The sulfuric acid hydrogen peroxide step, or sulfuric peroxide mixture (SPM), is essential for removing organic contaminants from post-etch substrates and ion-implanted films, as well as for platinum silicide residue...

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