Design View all

SPM Wafer Cleaning for Advanced Semiconductor Manufacturing

Wafer cleaning is one of the most critical steps in the semiconductor process flow, especially as dimensions continue to shrink to below the 1-nanometer (nm) node. Photoresist residue and particulates can reduce yields in large-die AI chips, impacting the performance of the final product or causing the chips to be scrapped.   The sulfuric acid hydrogen peroxide step, or sulfuric peroxide mixture (SPM), is essential for removing organic contaminants from post-etch substrates and ion-implanted films, as well as for platinum silicide residue...

Siemens partners with Databricks and FFT to turn production data into scalable AI-driven insights

Siemens Industrial Edge and FFT DataBridge connect shopfloor and plant data directly to the Databricks Platform – no IoT middleware required New edge to cloud connectivity offers scalable advanced analytics and a unified, AI‑ready production data foundation Industrial customers can optimize their operations, reduce costs and increase productivity Siemens announced...

Devices View all

Latest Posts