Copper Dual Damascene for Wafer-Level Packaging: Enabling Reliable, High-Density Interconnects
Overcoming yield loss, reliability risks, and scaling limits in advanced packaging with high-aspect-ratio copper interconnects. As device architectures shrink, delivering high-reliability, fine-feature interconnects without sacrificing yield or performance has become a critical challenge for semiconductor manufacturers. In fan-out-wafer-level-packaging (FOWLP), chiplet-based designs, and high-density 2.5D/3D integration, the need for compact, high-performance...



