photoresist strip

Replacing NMP: Are You Ready?

Replacing NMP: Are You Ready?

NMP is an abbreviation for N-methyl-2-pyrrolidone (other synonyms are 1-Methyl-2-pyrrolidone and 1-Methyl-2-pyrrolidinone) (Figure 1). NMP has proven itself as an effective and versatile cleaning agent, removing photoresist residue while leaving the surface in good shape for processing steps downstream. However, its time may be short-lived as companies strive to meet environmental health and safet... »

Advanced Packaging Trends, Part I: Solving PR Strip and UBM/RDL Challenges

Advanced Packaging Trends, Part I: Solving PR Strip and UBM/RDL Challenges

Over the years, the semiconductor industry has relentlessly focused on shrinking gate dimensions to drive performance. This focus has now transitioned to the packaging side as customers are shifting from wire bonding to flip chip for use in wafer level packaging (WLP). According to VLSI Research, about 35% of chips are currently packaged using WLP techniques. Advanced packaging opportunities slowe... »

Dynaloy: Dynastrip DL9150

Dynaloy: Dynastrip DL9150

The newly released Dynastrip™ DL9150 is a non-TMAH containing multi-purpose photoresist and post-etch residue remover. With outstanding cleaning and metal compatibility, this product raises the bar for achieving environmental, health, and safety compliance while also performing as well as comparable products that contain TMAH. Testimonial: Dynaloy’s new solvent, Dynastrip DL9150, has demonstra... »