KOBUS

KOBUS has developped a unique deposition technology called F.A.S.T. for Fast Atomic Sequential Technology.
Launched during Semicon Europa last year, we developped an hybrid reactor between ALD and CVD, with plasma enhanced capability.
Offering thick and conformal deposition capability at high througput and compatible with low thermal budget constraints, our technology allow us to be the best candidate to answer the future needs in thin film deposition of advanced packaging.